Publication date: 2004-06-03 

Abstract

Disclosed are methods and apparatus for remediating embedded microbiological contaminants, e. g. , mold, fungus and bacteria. The method includes the step of exposing an embedded microbiological contaminant to a gas, e. g. , chlorine dioxide or ethylene gas, thereby remediating the microbiological contaminant.

　

 使用二氧化氯溶液的方法

摘要：公开了用二氧化氯溶液洗消微电子装备，水系统和医学修复工具的方法。还公开为实施此发明而提供装备和分配系统。